micron usaBoise, ID
DRAM Dry Etch Pathfinding Intern Process Innovation
DRAM Dry Etch Pathfinding Intern Process Innovation
DRAM Dry Etch Pathfinding Intern Process Innovation
micron usaBoise, ID
today
Semiconductor Processing TechniciansMicrosystems EngineersNanotechnology Engineering Technologists and Technicians
Semiconductor and Related Device ManufacturingSemiconductor Machinery ManufacturingResearch and Development in the Physical, Engineering, and Life Sciences (except Nanotechnology and Biotechnology)
Apply for this role →Micron Technology in Boise, Idaho is seeking a DRAM Dry Etch Process Pathfinding Intern to contribute to advanced plasma etch research for next‐generation memory products. You will work with experienced engineers, gain hands-on experience with dry etch equipment, and support data‐driven problem solving in a fast‐ paced lab environment. You will apply analytical methods, document results, and collaborate across teams while learning about vacuum systems, RF/plasma science, and semiconductor
Also on the board Same function, level within a rung
Level
Intern
Location
Boise, ID
Occupation
Semiconductor Processing Technicians
Industry
Semiconductor and Related Device Manufacturing
Posted
today